Lithography
Spin coating processing, exposure in contact and proximity mode
(mask aligner)
exposure in projection mode (automatic repeater)
e-beam exposure
Example
Focal plane filter mosaics for optical application
To fabricate mosaic filters with spectral characteristics it is required to arrange the different spectral areas laterally with an accuracy of a few pixels. Similarly all of the adjacent subfilters must be arranged without any gap, requiring a micrometer (µm) accuracy of the lateral edges.
This can only be realised by a sophisticated lithography which was developed by Supracon.
